tTitanium oxynitride coatings (TiNxOy) are considered a promising material for applications in dentalimplantology due to their high corrosion resistance, their biocompatibility and their superior hardness.Using the sputtering technique, TiNxOyfilms with variable chemical compositions can be deposited.These films may then be set to a desired value by varying the process parameters, that is, the oxygenand nitrogen gas flows. To improve the control of the sputtering process with two reactive gases andto achieve a variable and controllable coating composition, the plasma characteristics were monitoredin-situ by optical emission spectroscopy.TiNxOyfilms were deposited onto commercially pure (ASTM 67) microroughened titanium plates byreactive magnetron sputtering. The nitrogen gas flow was kept constant while the oxygen gas flow wasadjusted for each deposition run to obtain films with different oxygen and nitrogen contents. The physicaland chemical properties of the deposited films were analyzed as a function of oxygen content in thetitanium oxynitride. The potential application of the coatings in dental implantology was assessed bymonitoring the proliferation and differentiation of human primary osteoblasts.