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Title

MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

Authors
Whitlow, Harry J.
Norarat, Rattanaporn
Roccio, Marta
Jeanneret, Patrick
Guibert, Edouard
Bergamin, Maxime
Fiorucci, Gianni
Homsy, Alexandra
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Published in Nuclear Instruments and Methods in Physics Research. B. 2015, vol. 354, p. 34-36
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Research group Groupe Pascal Senn (954)
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WHITLOW, Harry J. et al. MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks. In: Nuclear Instruments and Methods in Physics Research. B, 2015, vol. 354, p. 34-36. https://archive-ouverte.unige.ch/unige:98765

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Deposited on : 2017-11-08

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