MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
Published inNuclear Instruments and Methods in Physics Research. B, vol. 354, p. 34-36
Publication date2015
Research group
Citation (ISO format)
WHITLOW, Harry J. et al. MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks. In: Nuclear Instruments and Methods in Physics Research. B, 2015, vol. 354, p. 34–36. doi: 10.1016/j.nimb.2014.10.024
Main files (1)
Article (Published version)
Identifiers
- PID : unige:98765
- DOI : 10.1016/j.nimb.2014.10.024
ISSN of the journal0168-583X