MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

Whitlow, Harry J.; Norarat, Rattanaporn; Roccio, Marta; Jeanneret, Patrick; Guibert, Edouard; Bergamin, Maxime; Fiorucci, Gianni; Homsy, Alexandra; Laux, Edith; Keppner, Herbert; Senn, Pascal

doi:10.1016/j.nimb.2014.10.024

Scientific article

French

MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

ContributorsWhitlow, Harry J.; Norarat, Rattanaporn; Roccio, Marta; Jeanneret, Patrick; Guibert, Edouard; Bergamin, Maxime; Fiorucci, Gianni; Homsy, Alexandra; Laux, Edith; Keppner, Herbert; Senn, Pascal

Published inNuclear Instruments and Methods in Physics Research. B, vol. 354, p. 34-36

Publication date2015

Affiliation entities

Faculté de médecine / Section de médecine clinique / Département des neurosciences cliniques

Research groups

Groupe Pascal Senn (954)

Citation (ISO format)

WHITLOW, Harry J. et al. MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks. In: Nuclear Instruments and Methods in Physics Research. B, 2015, vol. 354, p. 34–36. doi: 10.1016/j.nimb.2014.10.024

Article (Published version)

Identifiers

PID : unige:98765
DOI : 10.1016/j.nimb.2014.10.024

Additional URL for this publicationhttp://linkinghub.elsevier.com/retrieve/pii/S0168583X14008623

Journal ISSN0168-583X

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MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

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