Two new, "user-friendly" derivatives of triptycene containing AsH2 and SiH3 fragments were synthesized. Both solids are crystalline, air-stable compounds characterized by elevated melting points and resistance toward moisture. The highly reactive As−H and Si−H bonds are protected by the presence of the surrounding phenylene hydrogen atoms, which ensure a remarkable kinetic stabilization of these primary hydrides. After X-ray irradiation of a single crystal of triptycenesilane, a persistent silyl radical was trapped and characterized.