Advances in Technological Design to Optimize Exposure and Improve Image Quality

Gutierrez Rios, Daniel Fernando; Zaidi, Habib

doi:10.1007/978-94-007-7256-4_10

Book chapter

Open access

English

Advances in Technological Design to Optimize Exposure and Improve Image Quality

ContributorsGutierrez Rios, Daniel Fernando; Zaidi, Habib

Published inRadiological Safety and Quality: Paradigms in Leadership and Innovation, Editors Lau, Lawrence. & Ng, Kwan-Hoong, p. 177-202

PublisherDordrecht : Springer

Publication date2013

Affiliation

Faculté de médecine / Section de médecine clinique / Département de radiologie et informatique médicale

Research group

Imagerie Médicale (TEP et TEMP) (542)

Citation (ISO format)

GUTIERREZ RIOS, Daniel Fernando, ZAIDI, Habib. Advances in Technological Design to Optimize Exposure and Improve Image Quality. In: Radiological Safety and Quality: Paradigms in Leadership and Innovation. Dordrecht : Springer, 2013. p. 177–202. doi: 10.1007/978-94-007-7256-4_10

Book chapter (Published version)

Identifiers

PID : unige:33220
DOI : 10.1007/978-94-007-7256-4_10

Commercial URLhttp://www.springer.com/medicine/radiology/book/978-94-007-7255-7

ISBN978-94-007-7256-4

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Creation2014/01/06 17:08:00

First validation2014/01/06 17:08:00

Update time2023/03/14 20:50:46

Status update2023/03/14 20:50:46

Last indexation2024/01/16 13:54:44

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Advances in Technological Design to Optimize Exposure and Improve Image Quality

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