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Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process

Authors
Koller, E.
Decroux, M.
Antognazza, L.
Published in Superconductor science and technology. 2010, vol. 23, no. 4, 045015
Abstract Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high- T c superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists of locally implanting Ga 3 + ions and/or defects instead of etching the film. This protocol could be of interest for engineering high- T c superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds.
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CURTZ, Noe et al. Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process. In: Superconductor science and technology, 2010, vol. 23, n° 4, p. 045015. doi: 10.1088/0953-2048/23/4/045015 https://archive-ouverte.unige.ch/unige:11804

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Deposited on : 2010-09-07

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