Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process

Curtz, Noe; Koller, E.; Zbinden, Hugo; Decroux, M.; Antognazza, L.; Fischer, Oystein; Gisin, Nicolas

doi:10.1088/0953-2048/23/4/045015

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Title		Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process
Authors		Curtz, Noe Koller, E. Zbinden, Hugo Decroux, M. Antognazza, L. Fischer, Oystein Gisin, Nicolas
Published in		Superconductor science and technology. 2010, vol. 23, no. 4, 045015
Abstract		Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high- T c superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists of locally implanting Ga 3 + ions and/or defects instead of etching the film. This protocol could be of interest for engineering high- T c superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds.
Identifiers		DOI: 10.1088/0953-2048/23/4/045015
Full text		Article (Accepted version) (698 Kb) - Free access Other version: http://iopscience.iop.org/0953-2048/23/4/045015/
Structures		Faculté des sciences / Section de physique / Groupe de physique appliquée Faculté des sciences / Section de physique / Département de physique de la matière quantique
Citation (ISO format)		CURTZ, Noe et al. Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process. In: Superconductor science and technology, 2010, vol. 23, n° 4, p. 045015. doi: 10.1088/0953-2048/23/4/045015 https://archive-ouverte.unige.ch/unige:11804