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Free accessOther version: http://iopscience.iop.org/0953-2048/23/4/045015/
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Scientific Article
unige:11804 
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Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process |
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| Published in | Superconductor Science and Technology. 2010, vol. 23, no. 4, p. 045015 | |
| Abstract | Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high- T c superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists of locally implanting Ga 3 + ions and/or defects instead of etching the film. This protocol could be of interest for engineering high- T c superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds. | |
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Article (Author postprint) (698 Kb) - Free access Other version: http://iopscience.iop.org/0953-2048/23/4/045015/ |
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| Citation (ISO format) | CURTZ, Noe et al. Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process. In: Superconductor Science and Technology, 2010, vol. 23, n° 4, p. 045015. https://archive-ouverte.unige.ch/unige:11804 |
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