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Scientific article
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Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process

Published inSuperconductor science and technology, vol. 23, no. 4, 045015
Publication date2010
Abstract

Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high- T c superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists of locally implanting Ga 3 + ions and/or defects instead of etching the film. This protocol could be of interest for engineering high- T c superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds.

Citation (ISO format)
CURTZ, Noe et al. Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process. In: Superconductor science and technology, 2010, vol. 23, n° 4, p. 045015. doi: 10.1088/0953-2048/23/4/045015
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ISSN of the journal0953-2048
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Technical informations

Creation08/23/2010 10:31:00 AM
First validation08/23/2010 10:31:00 AM
Update time03/14/2023 4:06:20 PM
Status update03/14/2023 4:06:20 PM
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