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Scalable Patterning of One-Dimensional Dangling Bond Rows on Hydrogenated Si(001) |
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Published in | ACS nano. 2013, vol. 7, no. 5, p. 4422-4428 | |
Abstract | Silicon dangling bonds exposed on the monohydride silicon (001) (Si(001):H) surface are highly reactive, thus enabling site-selective absorption of atoms, and single molecules into custom patterns designed through the controlled removal of hydrogen atoms. Current implementations of high-resolution hydrogen lithography on the Si(001):H surface rely on sequential removal of hydrogen atoms using the tip of a scanning probe microscope. Here, we present a scalable thermal process that yields very long rows of single dimer wide silicon dangling bonds suitable for self-assembly of atoms and molecules into one-dimensional structures of unprecedented length on Si(001):H. The row consists of the standard buckled Si dimer and an unexpected flat dimer configuration. | |
Keywords | Scanning tunneling microscopy — Scanning probe lithography — Self-assembly — One-dimensional — Dangling bond — Silicon — Dimer | |
Identifiers | DOI: 10.1021/nn4010236 | |
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Research group | Groupe Renner | |
Citation (ISO format) | BIANCO, François et al. Scalable Patterning of One-Dimensional Dangling Bond Rows on Hydrogenated Si(001). In: ACS nano, 2013, vol. 7, n° 5, p. 4422-4428. doi: 10.1021/nn4010236 https://archive-ouverte.unige.ch/unige:35924 |