High-temperature spectral hole burning on Samarium(II) in single crystals of the lead fluorohalide structure family and thin films of calcium fluoride

Bill, Hans; Jaaniso, Raivo; Hagemann, Hans-Rudolf; Lovy, Dominique; Monnier, Alain; Schnieper, Marc

doi:10.1117/12.201813

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Title		High-temperature spectral hole burning on Samarium(II) in single crystals of the lead fluorohalide structure family and thin films of calcium fluoride
Authors		Bill, Hans Jaaniso, Raivo Hagemann, Hans-Rudolf Lovy, Dominique Monnier, Alain Schnieper, Marc
Published in		Optical engineering. 1995, vol. 34, no. 8, p. 2333-2338
Abstract		When modern spectral hole burning applications for high-density information storage under noncryogenic temperatures are envisioned, it is necessary to develop new frequency-selective photoactive materials for this purpose. Mixed compounds of the PbFCl family, doped with samarium(II) ions, exhibit promising and true room-temperature hole burning capabilities. We investigate this class of systems (and related ones) by combining material synthesis and high-resolution spectroscopy. Whole groups of isomorphous crystals were synthesized with varying degrees of halide anion and/or cation substitutions. Thin films of fluoride-based materials were made in a laboratory-built molecular beam epitaxy system. An extended x-ray study, differential thermal analysis, luminescence, and Raman measurements allowed the characterization of the materials. Formal models were developed for both the inhomogeneous zero-phonon optical line shapes of the samarium(II) and the time evolution of the hole burning.
Identifiers		DOI: 10.1117/12.201813
Full text		Article (Published version) (723 Kb) - Limited access to UNIGE
Structures		Faculté des sciences / Section de chimie et biochimie / Département de chimie physique
Research group		Groupe Bill
Citation (ISO format)		BILL, Hans et al. High-temperature spectral hole burning on Samarium(II) in single crystals of the lead fluorohalide structure family and thin films of calcium fluoride. In: Optical engineering, 1995, vol. 34, n° 8, p. 2333-2338. doi: 10.1117/12.201813 https://archive-ouverte.unige.ch/unige:3537