Pressure effects on the HS -&gt; LS relaxation in [Zn1-xFex(6-mepy)3tren](PF6)2

Wang, Wei; Chan, I. Y.; Schenker, Sabine; Hauser, Andreas

doi:10.1063/1.473436

Scientific article

English

Pressure effects on the HS -> LS relaxation in [Zn1-xFex(6-mepy)3tren](PF6)2

ContributorsWang, Wei; Chan, I. Y.; Schenker, Sabine; Hauser, Andreas

Published inThe Journal of chemical physics, vol. 106, no. 9, p. 3817-3820

Publication date1997

Abstract

Laser flash photolysis experiments were performed on the mixed crystal [Zn1–xFex(6-mepy)3tren](PF6)2 (x=0.00025) at 10 K in the pressure range between 1 bar and 20 kbar. An external pressure of 20 kbar accelerates the low-temperature tunneling process by almost eight orders of magnitude.

Keywords

Zinc compounds
Iron compounds
Photolysis
High-pressure effects
Tunnelling

Affiliation entities

Faculté des sciences / Section de chimie et biochimie / Département de chimie physique

Research groups

Groupe Hauser

Citation (ISO format)

WANG, Wei et al. Pressure effects on the HS -> LS relaxation in [Zn1-xFex(6-mepy)3tren](PF6)2. In: The Journal of chemical physics, 1997, vol. 106, n° 9, p. 3817–3820. doi: 10.1063/1.473436

Identifiers

PID : unige:2789
DOI : 10.1063/1.473436

Journal ISSN0021-9606

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Pressure effects on the HS -> LS relaxation in [Zn1-xFex(6-mepy)3tren](PF6)2

Laser flash photolysis experiments were performed on the mixed crystal [Zn1–xFex(6-mepy)3tren](PF6)2 (x=0.00025) at 10 K in the pressure range between 1 bar and 20 kbar. An external pressure of 20 kbar accelerates the low-temperature tunneling process by almost eight orders of magnitude.

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